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The NanoFab, part of
NIST’s Center for Nanoscale Science and Technology,
provides its users with state-of-the-art equipment, expert training, and a high level of flexibility. It is
able to satisfy the needs of users ranging from novice to the most advanced experts in the field. The CNST NanoFab
has successfully supported advanced research projects in polymers, biology, nanoelectromechanical systems, ceramics,
radiation physics, atomic physics, optics, and more. It also provides access to a wide variety of measurement and
characterization tools, technologies, and expertise to NIST and its partners.
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What we do | ||||||||||||
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Staff directory | ||||||||||||
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NanoFab Newsletters | ||||||||||||
Using the NanoFab Facilities
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Seminar Series
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NanoFab Infrastructure
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| NanoFab Equipment: The CNST’s NanoFab houses a multi-million dollar suite of state-of-the-art nanofabrication and nanomeasurement equipment. This equipment is selected to provide our users with a high degree of flexibility with tomorrow’s technologies . All of the tools within the CNST NanoFab are designed to accommodate a wide variety of materials and substrate sizes from small pieces to conventional size wafers. They have been installed to facilitate upgrades and simplify modification to accommodate rapid changes in technology. The tools and operating procedures have been selected to provide hands-on users with easy-run operations allowing the tools to be used with minimal time investment by users ranging in experience from novice to expert. Alternatively, the tools can be operated by one of CNST’s process engineers. |
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Lithography: Tools to provide nanoscale image transfer with consistent repeatability and throughput. An ultra high resolution Electron Beam Lithography System from Vistec (formally Leica) provides for direct write nanoscale feature development and mask writing capability from small samples up to 300 mm substrates. A second E-beam lithography tool, JEOL-6300, is designed for direct writing on wafers with a 2nm spot size on substrate up150x190mm in size. A state-of-the-art Nano-imprint lithography system from Nanonex produces nanoscale features in soft materials from a hard mask made using the CNST NanoFab’s Vistec E-beam writer. |
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Specialty Tools: A Zeiss NVision 40 Focused Ion Beam combines a FIB and a Gemini SEM to enable a variety of nanotech capabilities. |
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Post Process: Tools to bring nanoscale fabricated devices to the test bench and finally to the customer. |
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Furnaces/CVD: Tools for nanoscale film deposition with high purity, excellent uniformity and stress control. |
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Dry Etch: Tools to transfer photolithographic nanoscale imaging into hard thin film materials eliminating the use of hazardous liquid chemistries. |
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Metal Deposition: Tools to provide a wide variety of metal applications to create electrical contacts, magnetic devices and masking materials. |
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Wet Chemistry: Tools to clean and etch materials in a controlled, safe environment. |
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Inspection: High magnification optical microscopes with image capture, FESEM, ellipsometry, profilometry, and electrical parametric testing. |
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Complete Equipment Listing |
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Privacy Policy | Security Notice Accessibility Statement | Disclaimer | FOIA NIST is an agency of the Online: February 2006 |
NanoFab News and Highlights
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Technical inquiries: NanoFab Manager National Institute of Standards and Technology 100 Bureau Drive, Stop 6201 Gaithersburg, MD 20899-6201 Phone: 877-NANO-US1 Website comments: Feedback |
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