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The Nanofabrication Research Group, part of NIST’s Center for Nanoscale Science and Technology, is pursuing projects designed to advance the state-of-the-art in nanomanufacturing techniques. Measurement tools are being developed to enable the characterization of both "top-down" lithographic and "bottom-up" directed assembly approaches.

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Research Areas

- Electronic Nanodevices
Application of new fabrication techniques toward patterning of novel materials into functional electronic nanoscale devices.
   
- Nanoplasmonics
Nanoscale metallo-dieletric systems for measurement and communications.
   
- Nanophotonics
Design, fabrication, and characterization of chip-based optical structures that confine light to wavelength-scale spatial dimensions, and studies of light-matter interactions within these structures and their application to nanoscale measurement.
   
- Nanofabrication and Directed Self-Assembly
Measuring the nanoscale processes occurring in conventional and novel nanomanufacturing techniques.
   
- Optical MEMS and NEMS
Combining optics, micro electro mechanical systems (MEMS) and nanoscale probes to create a toolkit for metrology and manufacturing of nanosystems.
   
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Online: March 2007
Last updated: August 2008

Lithographically directed assembly of PS-PMMA block copolymer with 49 nm domain period

Lithographically directed assembly of PS-PMMA block copolymer with 49 nm domain period.


Technical inquiries: James "Alex" Liddle
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